Patterning interfaces near the atomic limit: lessons from the cell membrane

Shelley A. Claridge / Purdue University

April 28, 2021, 3 - 4 pm CET

Online live talk


Many applications in modern materials science require surfaces with embedded chemical information at scales < 10 nm, to control interactions with light for energy conversion, to direct the flow of electrons, or to induce molecular recognition with receptor protein complexes on cell surfaces. Lithographic patterning rapidly becomes more expensive at scales below 100 nm, and is limited in terms of the chemistry that can be patterned. Conversely, biology generates a spectacular diversity of chemical patterns at few-nm scales, to control chemical and mechanical circuits that are central to biological function. A fundamental transformation to the molecular constituents of cell membranes enables us to use them to pattern interfaces with resolution exceeding that available at cutting edge lithographic fabrication facilities. We describe technological applications of the powerful chemical control enabled by this approach, from templating inorganic nanowires to scaffolding cell growth.

Shelley A. Claridge

Shelley Claridge received undergraduate degrees in mathematics and biochemistry from Texas A&M University, and subsequently worked as a software engineer for six years prior to completing a Ph.D. at UC Berkeley with Paul Alivisatos and Jean Fréchet. After a postdoctoral fellowship with Paul Weiss at UCLA, she joined the faculty at Purdue University in 2013, and was promoted to Associate Professor with tenure in 2019. Her research at Purdue has been recognized with Young Investigator awards from NSF, DARPA (2017 Young Faculty Award and 2019 DARPA Director’s Fellowship), 3M, and DuPont (one of 8 globally in 2016), as well as emerging investigator recognitions from ACS Nano, Journal of the American Chemical Society, Chemical Communications, Analytical Methods, and Analytical and Bioanalytical Chemistry. Work from her group has also been the subject of 3 granted patents and 6 additional pending patent applications to date.

She is together with Wei-Ssu Liao the editor of the thematic issue "Nanoscale patterning and characterization" in the Beilstein Journal of Nanotechnology.

Download the complete PDF of the thematic issue "Nanoscale patterning and characterization" with one click.


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